Opportunity timeline

PostedSep 1, 2026
DeadlineSep 14, 2026

In plain English

The Department of Defense wants an atomic layer deposition reactor system for precise oxide, nitride, and metal film coating on high-aspect-ratio substrates. The system must support both thermal ALD and plasma-enhanced ALD modes. This request is set aside for small businesses; solicitation number N00173-26-Q-TB02 applies.

About this opportunity

COMBINED SYNOPSIS / SOLICITATION FOR COMMERCIAL ITEMS This is a combined synopsis/solicitation for commercial products or commercial services prepared in accordance with part 12. This announcement constitutes the only solicitation. Offers are being requested and a separate written solicitation will not be issued. Solicitation number N00173-26-Q-TB02 is issued as a request for quotation (RFQ) for an atomic layer deposition (ALD) reactor for the uniform and conformal deposition of oxide, nitride, and metal films with atomic-layer precision onto substrates of high aspect ratio surface topographies using both traditional thermal atomic layer deposition (ALD) and plasma enhanced ALD (PE-ALD)…

Time remaining

Closes Sep 14, 2026

00Days
:
18Hours
:
48Min
:
23Sec

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Bid details are gathered and summarized automatically. Please verify details at the original source.

Ref No.

BS-D0BF16